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ATV Oxidation Diffusion Furnace and LPCVD Furnace

ATV PEO-604 geoeffnet                                  ATV PEO-604 geschlossen

Application

Dry oxygen, wet oxygen, diffusion, LPCVD process.

Characteristic

·        Suitable for various furnace processes of wafers up to 200 mm.

·        Temperature 250-1100 degrees.

·        100 wafer/per furnace.

·        Vacuum to 5x10-6mbar

·        Temperature uniformity +/-1.5 degrees

·        Constant temperature zone: 320 mm

·        The same furnace can make different LPCVD processes by changing inner tubes.

For detail please contact our expert:

Info@dehongmp.com